Fremont, CA, May 13, 1999-Asyst Technologies, Inc. (Nasdaq:ASYT), the leading supplier of Standard Mechanical InterFace (SMIF) isolation and manufacturing automation solutions to the semiconductor industry, today announced it has received a multimillion-dollar order from a large U.S. reticle manufacturer for its Asyst reticle SMIF systems, which will be used in the manufacture of advanced reticles. The order marks the first time that SMIF technology will be deployed in a reticle manufacturing facility and also coincides with the International 300 mm Initiative (I300I's) selection of reticle SMIF technology as the standard for reticle carriers and automation in 300 mm integrated circuit (IC) fabs, providing a common reticle tool interface. Tools for this customer are scheduled for installation beginning in June 1999.

Commenting on the significance of the order, Asyst's Senior Vice President of Global Customer Operations Dennis Riccio noted, "For more than 12 years, Asyst-SMIFÔ technology has been widely accepted for both reticle and wafer management in semiconductor facilities, including approximately 50,000 Asyst reticle SMIF pods in use worldwide. However, SMIF has not been widely deployed in reticle manufacturing facilities to date. As reticle manufacturing protocols become more complex and stringent, they drive the requirements for advanced contamination control and automated material handling that SMIF provides. We are pleased to be partnering with this customer in pioneering automated reticle manufacturing, helping them move directly to 'hands-off' reticle manufacturing." Riccio continued, "This represents a great deal of untapped market potential for SMIF technology and for Asyst."

The customer's selection of Asyst as its reticle SMIF tool supplier was based on the following criteria: (1) the need for contamination control capable of meeting current and future requirements; (2) the need for a pod architecture that accommodates both 6-inch and 230 mm reticles - the next generation reticle size; (3) the ability to provide "edge of the edge" contact only reticle handling; and (4) the use of existing industry standards and equipment. The customer's prior experience with Asyst-SMIF for semiconductor manufacturing was also a factor in the decision.

Reticles-patterned quartz substrates used in conjunction with steppers to print images on a silicon wafer are essential in creating the master device images on which ICs are based - represent substantial investments for both the chipmakers and reticle manufactures. Reticles can cost up to $40,000, and on average, more than 20 different reticles are used to produce a semiconductor device. Defects on the reticle are converted as flawed images or patterns on the semiconductor wafer after each exposure in the photolithography process, semiconductor yields can be greatly affected. The area of reticles subject to defects as a result of particles or contaminants, misprocessing, and electrostatic discharge (ESD) is much larger than that of a semiconductor die. In addition, defects considered critical to reticles are now the size that was considered critical to semiconductors only a few years ago.

SMIF provides a means of protecting reticles from these defects by isolating the reticles from potential contaminants and providing 'hands-off' reticle management during reticle manufacture or wafer processing. During reticle manufacture, SMIF enables the use of auto-ID, helping to eliminate misprocessing. In addition, SMIF can be used to significantly extend the life of existing mask manufacturing facilities.

The order includes Asyst's reticle pods, which provide contamination control during reticle transportation and storage, as well as Asyst's reticle SMIF interface systems and Asyst's reticle SMIF minienvironments for the reticle manufacturing tools and new reticle sorters. Asyst's reticle SMIF pods are the first designed to handle both 6-inch and 230 mm reticles. In addition, Asyst's reticle pods provide the capability to address the transport and protection requirements of the masks used in the Scattering with Angular Limitation Projection Electron-beam Lithography (SCALPEL®) process invented by Bell Labs. SCALPEL technology was recently recommended by International SEMATECH as one of two possible successors to optical lithography. Asyst's reticle SMIF tools will be used in the production of leading-edge photomasks for the customer's captive and merchant customers.

Reticle SMIF architecture has been selected by I300I as the design standard for storing and transporting reticles in future 300 mm IC fabs. Asyst's reticle pod, based on its 200 mm SMIF-PodÔ, allows any reticle size up to 230 mm to be accommodated. A new Semiconductor Equipment and Materials International (SEMI) standard for this reticle pod is currently being balloted for approval. This technology uses existing 200 mm SEMI SMIF and loadport standards. Consequently, it allows reticle equipment suppliers to leverage SMIF interfaces and automation solutions proven in more than 65 semiconductor fabs worldwide.

According to Anthony Bonora, Asyst's senior vice president and chief technology officer, "This SMIF project has been favorably received by reticle equipment suppliers, who have long called for an established standard for reticle carriers and reticle manufacturing automation. Reticle equipment suppliers can concentrate on their differentiating process and metrology technology, not user-specific automation requirements. Equally important, reticle manufacturers can now benefit from the proven material handling, tool interface and automation capabilities SMIF has provided IC makers for many years." Asyst's reticle SMIF solutions are now available for OEM integration.

Except for statements of historical fact, the statements in this press release are forward-looking. Such statements are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include, but are not limited to, general economic conditions, semiconductor industry cycles, risks associated with the acceptance of new products and product capabilities, and other factors more fully detailed in the Company's most recent Forms 10-K and 10-Q, and annual report to shareholders.

About Asyst:
The pioneer of the Standard Mechanical InterFace (SMIF), Asyst Technologies, Inc. is the leading provider of automated material handling systems and software critical to seamless factory automation in the most advanced fabs worldwide. Asyst's comprehensive solutions, which include industry-leading loadport, auto ID, environmental control, robotic, and automation software products for 200 mm and 300 mm applications, result in greater fab profitability and productivity.

Scattering with Angular Limitation Projection Electron-beam Lithography and SCALPEL are registered trademarks of Bell Labs.